Development Trend Of PCB Photoresist Special Chemical Technology
The thinness and thinness of terminal electronic products, the rapid development of integration of semiconductors and other components, and the advancement of assembly technology have promoted the refinement and high density of PCB guide lines. HDI circuit boards, packaging substrates and flexible circuit boards and other high-end products have advanced the technological requirements of dry film photoresist and photo-imaging solder mask inks for sensitivity, resolution, adhesion and other performance requirements. The pressure is constantly increasing. Photoresist-specific chemicals are trending towards higher performance and environmental friendliness.
A. Photoinitiators play a decisive role in the sensitivity, deep curing, and adhesion of dry film photoresists and photoimageable solder mask inks. The use of high-performance photoinitiators with higher light absorption efficiency and faster photosensitivity or the use of complex photoinitiators to facilitate absorption of light in a larger wavelength range to improve sensitivity is the development trend of photoinitiators.
B. The photoresist resin has a great influence on the film-forming properties of the dry film photoresist. The thickness of the dry film photoresist is an important factor affecting the resolution of the dry film photoresist. The thickness of the high resolution dry film photoresist is usually thinner, below 30 microns. For thin film photoresist, to maintain the same film formation, developability, adhesion, etching resistance, unevenness followability, etc. after exposure, the composition, molecular weight, and molecular weight distribution of the resin must be performed according to customer requirements Design and development to improve the film-forming performance of the resin.
C. Increased use of photosensitizers. With the technological advancement of HDI boards and multi-layer boards, the requirements for PCB circuit line width and alignment accuracy are becoming higher and higher. The traditional mask exposure process cannot overcome the distortion and scaling processing between multi-layer boards. Facing the bottleneck of production technology, laser direct imaging (LDI) technology came into being and became the mainstream of lithography process technology. The laser light source is different from the traditional high-pressure mercury lamp light source. It is a single-wavelength i-line (355 nm) or h-line (405 nm). The change of the exposure light source has put forward new requirements for the development of dry film photoresist. The dry film photoresist corresponding to the LDI company needs to add a photosensitizer that absorbs laser light at 355nm or 405nm, and the light energy is transmitted to the photoinitiator through the photosensitizer. LDI dry film photoresist is now growing at an annual growth rate of 30-40% 1, and the demand for photosensitizers is increasing. In addition, laser imaging technology is also applied to photo-imaging solder resist inks, and the corresponding market demand for photo-sensitizers for laser-imaging solder resist inks is also increasing.
D. The environmental protection requirements of PCB production are getting higher and higher. In the lithography imaging process, due to the poor solubility of the special photoinitiator in the ordinary dry film photoresist formula and the large amount of residue, the development tank needs to be cleaned frequently, which not only affects the production efficiency of PCB manufacturers, but also brings PCB manufacturers Environmental issues for residue disposal. An environmentally friendly and friendly photoinitiator suitable for dry film photoresist formulations with good solubility is the future development trend.
E. As PCB photoresist manufacturers move to China's industry, the market share and industry position of PCB photoresist chemicals are also gradually changing. Before 2002, all the dry film photoresist and photo-imaging solder resist ink required by China needed to be imported, and there were no manufacturers of PCB photoresist chemicals in China. After 2002, Japan and Taiwan's dry film photoresist and photoimageable solder mask ink companies began to build production plants in China. Taiwan's photoinitiator suppliers also set up factories in China, and Japan's photoresist resin companies also set up in China. Factory supporting supply.
1. Cyclic industry
The photoresist special chemical industry is at the forefront of the electronics industry and other industries, providing them with supporting special chemical materials. The terminals of the industrial chain include consumer electronics, household appliances, information and communications, automotive electronics, aerospace, military and other national economies and national defense. In many areas of construction, the demand is highly fragmented. Although it will be affected by some specific industries such as the semiconductor and LCD industries, there is no significant industry cycle, which is mainly related to global and national macroeconomic trends.
2, industry regional
The development of Japan's photoresist specialty chemicals industry is in an overall leading position. The domestic photoresist specialty chemicals industry is in a rapid development stage, mainly located in two industrial clusters in the Pearl River Delta and the Yangtze River Delta.
The LCD photoresist specialty chemicals market is mainly concentrated in Japan, South Korea, and Taiwan. Demand for semiconductor photoresist chemicals is concentrated in Japan.
3. Industry seasonality
Industry segmentation has a certain seasonality. Generally, the demand in the second and third quarters is slightly larger than that in the first and fourth quarters.